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OSEMA 2012 : 2nd International Workshop on Ontology and Semantic web for Manufacturing (OSEMA 2012)


When Jul 24, 2012 - Jul 25, 2012
Where Graz, Austria
Submission Deadline Apr 30, 2012
Notification Due May 15, 2012
Final Version Due Jun 16, 2012
Categories    ontology   semantic web   manufacturing   OWL

Call For Papers

2nd International Workshop on Ontology and Semantic web for Manufacturing (OSEMA 2012):
at the 7th International Conference on Formal Ontologies in Information Systems (FOIS 2012):
July 24th or 25th Graz, Austria


Developing innovative and competitive products in a globalized world requires an orchestrated Product Life Cycle Management (PLM). Apart from enterprise policies and good human-based communication channels, appropriate technologies which support representing, managing and reusing the PLM knowledge as well as inferring implicit knowledge in large and geographically distributed knowledge bases are mandatory. Some requirements, related with knowledge, are considered in Ontology and the Semantic Web framework. That is causing an increasing interest in using them into the manufacturing domain. Design for Manufacturing (DfM), Concurrent Engineering (CE) and Flexible Manufacturing Systems (FMS) are modern manufacturing approaches in which the search of orchestration becomes evident. Today there is still the necessity of methodologies, frameworks, software tools and more use cases to support industrial implementations. Ontologies have been used to model products and more recently other resources (machine-tools). In the same way the Semantic Web could support the workflow and decision making in the PLM, enabling automatic information retrieval and reasoning. It is necessary to provide a discussion scenario where theoretical positions, best practices, implementations, proposals of standards, and frameworks are presented. It will deserve special interest to discuss how the manufacturing industry can take advantage of Semantic Web technologies.


- How can the Semantic Web support the development of new products?
- Ontological framework for manufacturing and interoperability
- A CAD ontology per standard? Or a CAD upper ontology?
- Description Logic, First Order Logic, or Common Logic in the manufacturing domain?
- One enterprise ontology or modular enterprise ontology?
- How can OWL be used to represent processes in the manufacturing domain?
- Knowledge management over the manufacturing "Know how".
- How can the versioning of products be managed? Can ontology help? How?
- How can raw materials be semantically described?
- Semantic search over the manufacturing information space.
- How can tagging techniques be applied within the manufacturing domain?
-Ontology repositories for the manufacturing domain.

We want to bring together researchers and practitioners active in the design, development, and application of ontologies and the Semantic Web in the manufacturing domain, as well as industrial representatives in Computer Aided Design (CAD), Computer Aided Process Planning (CAPP), and Computer Aided Manufacturing (CAM) industry who are interested in integrating the Product Life Cycle management into their software tools.

Submission deadline: 30 April (23:59 Hawaii Time)
Notification of acceptance: 15 May
Camera-ready submission: 16 June (23:59 Hawaii Time)
Date of workshop: 24 July or 25 July


Only electronic submissions will be considered. All submissions should be submitted in pdf format, to (about:blank).
Submissions should not exceed 14 pages and Papers should be submitted electronically as PDF files prepared in accordance with the IOS formatting guidelines. (
The workshop proceedings will be uploaded to CEUR ( .

Adila A. Krisnadhi, Wright State University, United States of America.
Aristeidis Matsokis, Holcim, Switzerland.
Amina Chniti, IBM Software Group, AIM Division. France.
Aziz Bouras, University Claude Bernard Lyon II, France.
George Tsinarakis, Intelligent Systems and Robotic Laboratory. Greece.
Hilmer Palomares, Universidad Nacional Abierta, Venezuela.
Katariina Nyberg, Aalto University, Dept. of Media Technology, and
University of Helsinki, Finnland.
Marcela Vegetti, Institute of Design and Development, Argentina.
Oliver Eck, Department of Computer Science, HTWG Konstanz, Germany.
Parisa Ghoudous, University Claude Bernard Lyon I, France.
Richard Gil Herrera, University Simón Bolivar. Venezuela.
Suvodeep Mazumdar, University of Sheffield. United Kingdom.
Thomas Moser, Vienna University of Technology, Vienna, Austria.

Luis Enrique Ramos García, University of Bremen, Germany. (Contact person) Email:
Sylvere Krima, National Institute of Standards and Technology (NIST)
Dimitra Anastasiou, University of Bremen
Yuh-Jen Chen (to be confirmed), National Kaohsiung First University of Science and Technology, Taiwan.

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