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RePa 2011 : 1st International Workshop on Requirements Patterns


When Aug 29, 2011 - Aug 29, 2011
Where Trento, Italy
Submission Deadline Jun 1, 2011
Notification Due Jun 27, 2011
Final Version Due Jul 21, 2011
Categories    software engineering   requirements engineering   software pattern

Call For Papers


1st International Workshop on Requirements Patterns (RePa’11)
in conjunction with 19th IEEE Requirements Engineering Conference
Aug. 29, 2011, Trento, Italy

Submission deadline: extended to Wed. June 1, 2011
Email inquiries to


Getting requirements right is critical to the success of just about any software development project, and yet oftentimes challenging and in need of a large amount of knowledge and experience. "Patterns" have been used to capture knowledge of software development, concerning software architectures, component designs and programs, and more recently requirements engineering too. This workshop provides an open forum for researchers and practitioners to exchange ideas and experience, regarding pattern-based approaches to capturing, organizing, and reusing all aspects of requirements engineering-related knowledge, from both product and process perspectives.


This workshop invites two types of submissions: papers on specific patterns and technical papers. Each submission may be a full or short paper, while a (full or short) technical paper may be a report on findings or a position paper on a related topic.

Papers on Specific Patterns:
Submissions of specific patterns of all requirements engineering-related knowledge are encouraged. Examples of such patterns include, but not limited to:

* Requirements modeling patterns
* Requirements engineering process/activities patterns
* Application/domain-specific requirements patterns
* Application/domain-independent requirements patterns
* Goal patterns
* Social aspect patterns
* Scenario patterns
* Workflow patterns
* Functional requirements (FRs) patterns
* Non-functional requirements (NFRs) patterns (e.g. security or usability heuristics patterns)
* Problem patterns (e.g. anti-patterns, mis-use patterns, fault patterns, attack patterns)
* Requirements to architecture/design mapping patterns

Technical Papers:
This workshop also welcomes technical papers, including full and short research and position papers, experience reports, empirical studies, case studies that report findings on requirements pattern-related topics, including, but not limited to:

* Capturing patterns
* Harvesting and mining patterns
* Cataloging patterns (e.g. by categories)
* Organizing and relating patterns (e.g. by relationships such as uses, meta-pattern/occurrence,
generalization/specialization, and aggregation/decomposition)
* Searching, identifying, and selecting applicable patterns
* Reusing and applying patterns
* Quality of patterns
* Pattern management
* Tool support


The workshop will consist of two sessions: one for papers on specific patterns and another for technical papers. Papers on specific patterns will be discussed in small groups based on the patterns of interest, the technical papers will be presented using the traditional technical presentation format by the authors.


Each submission is required to meet the requirements listed below and will be reviewed by at least two Program Committee members. A proceedings of accepted papers will be published in the IEEE Digital Library.

Formatting Requirements:
* Format the paper according to the IEEE Conference Publishing Services formatting instructions.
* Do not exceed 10 pages (4 pages for short papers).
* Paper on specific patterns may optionally be structured using a pattern template when it is appropriate. Examples of pattern templates are available at:

Submission Instructions:
Submit the paper in PDF format using the on-line EasyChair page:;id=39861

* Submission : extended to Wed. June 1, 2011
* Notification : Mon. June 27, 2011
* Camera-ready : Thursday July 21, 2011
* Workshop : Mon. Aug. 29, 2011

* Ian Alexander, Scenario Plus, UK
* Paris Avgeriou, University of Groningen, The Netherlands
* Joy Beatty, Seilevel Inc., USA
* Brian Berenbach, Siemens Corporate Research, USA
* Betty H.C. Cheng, Michigan State University, USA
* Lawrence Chung, University of Texas at Dallas, USA
* Jane Cleland-Huang, DePaul University, USA
* Xavier Franch, Universitat Politècnica de Catalunya, Spain
* Lars Hagge, Deutsches Elektronen-Synchrotron, Germany
* Frank Houdek, Daimler, Germany
* Michael Jackson, The Open University, UK
* Kyo C. Kang, Pohang University of Science and Technology, Korea
* Axel van Lamsweerde, Université catholique de Louvain, Belgium
* Julio Cesar Sampaio do Prado Leite, Pontifícia Universidade Católica do Rio de Janeiro, Brazil
* Lin Liu, Tsinghua University, China
* Pericles Loucopoulos, Loughborough University, UK
* Neil Maiden, City University London, UK
* Barbara Paech, University of Heidelberg, Germany
* Linda Rising, Independent Consultant, USA
* Colette Rolland, Université Paris1 Panthéon Sorbonne, France
* Alistair Sutcliffe, The University of Manchester, UK
* Michael Weiss, Carleton University, Canada
* Eric Yu, University of Toronto, Canada

* General Chair:
Barbara Paech, University of Heidelberg
* Program Co-chairs:
Neil Maiden, City University London
Lawrence Chung, University of Texas at Dallas
Sam Supakkul, University of Texas at Dallas

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