Call for Papers
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Third International Workshop on Requirements Patterns (RePa’13)
July 15, 2013, Rio de Janeiro, Brazil.
In conjunction with the 21th IEEE Requirements Engineering Conference

Getting requirements right is critical to the success of just about any software development project, and yet oftentimes challenging and in need of a large amount of knowledge and experience. "Patterns" have been used to capture knowledge of software development, concerning software architectures, designs, and more recently requirements engineering too. This workshop provides an open forum for researchers and practitioners to exchange ideas and experience, regarding pattern-based approaches to capturing, organizing, and reusing all aspects of requirements engineering-related knowledge, from both process and product perspectives.

RePa’13 Workshop invites two types of submissions: papers on specific patterns and technical papers. The accepted papers will be available in a proceedings published by the IEEE Digital Library.

Papers on Specific Patterns:
A pattern paper presents one or more related requirements process/product patterns, including, but not limited to:

- Requirements modeling patterns
- Requirements engineering process/activities patterns
- Application/domain-specific requirements patterns
- Application/domain-independent requirements patterns
- Functional requirements (FRs) patterns
- Non-functional requirements (NFRs) patterns
- Goal patterns
- Social aspect patterns
- Scenario patterns (e.g. use cases, user stories)
- Workflow patterns
- Business patterns
- Analysis patterns
- Problem patterns (e.g. anti-patterns, mis-use patterns, fault patterns, attack patterns)
- Requirements to architecture/design mapping patterns

Technical Papers:
A technical paper may be a full or position research paper, an experience report, an empirical study, or a case study that reports findings on requirements pattern-related topics, including, but not limited to:

- Pattern capturing
- Pattern harvesting and mining
- Pattern cataloging (e.g. by categories)
- Pattern organization (e.g. by relationships such as uses, meta-pattern/occurrence, generalization/specialization, aggregation/decomposition)
- Pattern searching, identification, and selection
- Pattern reuse and application
- Pattern quality
- Pattern management
- Tool support

Workshop Co-chairs:
Sam Supakkul, Sabre Inc., USA
Lin Liu, Tsinghua University, China
Liping Zhao, University of Manchester, UK
Barbara Paech, University of Heidelberg, Germany
Lawrence Chung, University of Texas at Dallas. USA

Associate Chair:
James Naish, University of Manchester, UK

Program Committee:
Ian Alexander, Scenario Plus, UK
Daniel Amyot, University of Ottawa, Canada
Paris Avgeriou, University of Groningen, The Netherlands
Travis Breaux, Carnegie Mellon University, USA
Xavier Franch, Universitat Politècnica de Catalunya, Spain
Lars Hagge, Deutsches Elektronen-Synchrotron, Germany
Robert Hanmer, Alcatel-Lucent, USA
Kevlin Henney, Curbralan Limited, UK
Frank Houdek, Daimler, Germany
James Hulgan, Seilevel, USA
Julio Cesar Leite, Pontifícia Universidade Católica do Rio de Janeiro, Brazil
Pericles Loucopoulos, Loughborough University, UK
Colette Rolland, Université Paris1 Panthéon Sorbonne, France
Rosana T. Vaccare Braga, ICMC-Universidade de São Paulo, Brazil
Axel van Lamsweerde, Université catholique de Louvain, Belgium
Michael Weiss, Carleton University, Canada
Eric Yu, University of Toronto, Canada

Important Dates:
Submission: May 5, 2013
Notification: May 24, 2013
Camera-ready: June 7, 2013
Workshop: July 15, 2013

For more information and submission:
Please visit www.utdallas.edu/~supakkul/repa13