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ASMC 2010 : 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference | |||||||||||
Link: http://www.semi.org/asmc2010 | |||||||||||
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Call For Papers | |||||||||||
For over 20 years, the Advanced Semiconductor Manufacturing Conference (ASMC) has filled a critical need in our industry by providing the opportunity and the venue for technical managers, hands-on engineers, and other semiconductor industry professionals to network, learn, and share knowledge on new and best-method semiconductor manufacturing practices and concepts, in a relaxed, professional atmosphere. The conference synergy leads to understandings and relationships which can benefit participating companies in a variety of ways, including accelerating innovation, promoting successes, and getting a more thorough understanding of standards and benchmarks. In brief, ASMC highlights solutions that improve the semiconductor manufacturing process.
In 2010, ASMC moves to SEMICON West opening up greater opportunities for industry professionals to meet and discuss critical issues in semiconductor manufacturing. By re-locating to San Francisco, ASMC will bring its unique balance of device makers, equipment and materials suppliers, and academics to the industry’s premier event: SEMICON West. As part of SEMICON West, ASMC will continue a long tradition of unveiling breakthroughs in semiconductor manufacturing—from fab productivity and profitability to advanced process controls and device yield. Peer-reviewed technical papers and expert keynotes attract engineers and managers to advance their semiconductor manufacturing knowledge with real solutions…direct from the fab. Presentations on original, non-commercial and non-published works will be solicited on nineteen topics. * AM: Advanced Metrology * AEM: Advanced Equipment and Materials Processes * APC: Advanced Process Control * CFM: Contamination Free Manufacturing * DM: Data Management and Data Mining Tool * DI: Defect Inspection and Reduction * DFM: Design for Manufacturability * GF: Green Factory * ER: Equipment Reliability and Productivity Enhancements * FA: Factory Automation * IE: Industrial Engineering * ID: Innovative Devices * LM: Lean Manufacturing * LITHO: Lithography Advances/Challenges * TSV: Through Silicon Via * YE: Yield Enhancement/Learning * YM: Yield Methodologies ASMC 2010 ENTEGRIS BEST PAPER AWARD All papers presented at ASMC will be considered for the ASMC 2010 Entegris Best Paper Award, which will be announced following the conference and awarded at ASMC 2011. ASMC 2010 ISMI OUTSTANDING STUDENT PAPER Papers authored by an individual student or student/professor will receive special consideration for the 2010 ASMC Outstanding Student Paper competition. Students wishing to be considered for this award should so note in their abstract submission. The award will be announced following ASMC 2010 and presented at ASMC 2011. |
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