The 2009 Computational Color Imaging Workshop (CCIW'09) will be held in Saint Etienne, France, on March 26 and 27, 2009.

The first CCIW was organized in 2007 in Modena, Italy, with the endorsement of IAPR. This workshop was held along with the International Conference on Image Analysis and Processing (ICIAP), the main conference on image processing and pattern recognition organized every two years by the Group of Italian Researchers on Pattern Recognition (GIRPR) affiliated with the International Association on Pattern Recognition (IAPR).

The Second CCIW will be organized by the University Jean Monnet (Saint Etienne, France) with the endorsement of the International Association on Pattern Recognition (IAPR) and of the French Association for Pattern Recognition and Interpretation (AFRIF) affiliated with IAPR and with the endorsement of the "Groupe Français de l'Imagerie Numérique Couleur" (GFINC).

Planning this workshop, the organizers would like to focus on the methods and applications of digital color image processing and analysis. The workshop is intended for researchers and practitioners in the digital imaging, multimedia, visual communications, computer vision, and consumer electronic industry, who are interested in the fundamentals of color image processing and its emerging applications in the areas listed below:


Computational color vision models


Color constancy


Color image understanding and analysis


Color data compression and encoding
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Color image/video indexing and retrieval


Color reproduction (printing, scanning, displays)


Digital photography


Color image filtering and enhancement


Digital color image content protection


Color image/video quality assessment


Multi-spectral and high dynamic range imaging


Applications and future trends

The CCIW'09 proceedings will be published by Springer Verlag in the Lecture Notes in Computer Science (LNCS) series http://www.springer.com/LNCS/.



Papers should be no more than 8-10 pages in length, conforming to the authors formatting instructions of Springer, LNCS series. Papers will be judged by an international program committee based on their originality, significance, correctness and clarity. All papers should be submitted electronically in PDF format at CCIW09 paper submission website.

Workshop Organizers/Chairs:

Raimondo Schettini
University of Milano Bicocca
Milano, Italy
schettini AT disco.unimib.it

Shoji Tominaga
Chiba University
Chiba, Japan
shoji AT faculty.chiba-u.jp

Alain Tremeau
Université Jean Monnet
Saint Etienne, France
Alain.Tremeau AT univ-st-etienne.fr

Workshop Program Committee:

Jesus Angulo, Ecole des Mines de Paris, France
James K. Archibald, Brigham Young Univ., Provo, UT, USA
Sebastiano Battiato, Università di Catania, Italy
Marco Bressan, Xerox, France
Majeb Chambah, Université de Reims, France
Cheng-Chin Chiang National Dong Hwa University, Taiwan
Bibhas Chandra Dhara, Jadavpur University, India
Francesca Gasparini, University of Milano Bicocca, Italy
Takahiko Horiuchi, Chiba University, Japan
Hubert Konik, Université de Saint Etienne, France
Patrick Lambert, Université de Savoie, France
J. Lee, Brigham Young Univ., Provo, UT, USA
Jianliang Li, Nanjing University of Science & Technology, P.R. China
Peihua Li, Heilongjiang University, China
Chiunhsiun Lin National Taipei University, Taipei, Taiwan
Ludovic Macaire, University of Lille, France
Lindsay MacDonald, London College of Communication, UK
Massimo Mancuso, STMicroelectronics, France
Jussi Parkkinen, University of Joensuu, Finland
Steve Sangwine, University of Essexs, UK
Gerald Schaefer, Aston University, United Kingdom
Ishwar K. Sethi, Oakland University, Rochester, Michigan, USA
Xiangyang Xue, Fudan University, China
Rong Zhao, Stony Brook university, USA
Silvia Zuffi, CNR, Italy