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SISPAD 2011 : International Conference on Simulation of Semiconductor Processes and Devices | |||||||||||
Link: http://www.si.eei.eng.osaka-u.ac.jp/sispad/2011/ | |||||||||||
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Call For Papers | |||||||||||
Scope:
This conference provides an opportunity for the presentation and discussion of the latest advances in modeling and simulation of semiconductor devices, processes, and equipments for integrated circuits. Topics: - Simulation and modeling based on continuum and/or particle methods for all sorts of devices including next generation CMOS devices, emerging memory devices, optoelectronic devices, lasers, TFTs, organic electronic devices, micro/nano sensors, power electronic devices and other semiconductor-based "green" devices, spintronics devices, tunnel FETs, SETs, carbon-based nanodevices, molecular devices, and bioelectronic devices. - Fundamental aspects of device modeling and simulation such as quantum transport, fluctuation, noise, and reliability issues. - All sorts of process simulations and modeling based on continuum and/or atomistic approaches, including the first-principles material design and growth simulation of nano-scale fabrication. - Compact modeling for circuit simulation, including high frequency applications. - Process/device/circuit simulation in context with system design and verification. - Equipment, topography, lithography modeling and algorithms. - Interconnect modeling and algorithm including noise and parasitic effects. - Advanced numerical methods and algorithms including grid generation, user-interface, and visualization. - High precision metrology for the modeling of semiconductor devices and processes. Abstract Submission: Authors should send a PDF file of a two-page abstract (A4 size or 22X28 cm) including figures and a reply form by e-mail. Detailed information including a reply form will be updated in the Second Call for Papers and the following web site in January, 2011. |
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